X AR 600-50/2 是一种新的、非常灵敏和高选择性的 AR-P 617显影液。即使在较长的显影时间下,暗腐蚀也非常低。PMMA 或 CSAR 62 的层不会受到攻击,这对于多层流程尤其重要。通过显影时间可以很好地调整灵敏度。
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显影液百科信息
X AR 600-50/2 是一种新的、非常灵敏和高选择性的 AR-P 617显影液。即使在较长的显影时间下,暗腐蚀也非常低。PMMA 或 CSAR 62 的层不会受到攻击,这对于多层流程尤其重要。通过显影时间可以很好地调整灵敏度。
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我们的高灵敏度电子束光刻胶 AR-P 617 经常用于双层胶工艺,主要与 PMMA 结合使用,用于生产T-gate等剥离结构。通常必须确保两个胶层可以选择性地并且彼此独立地显影。尽管包含 MIBK 的显影液可用于此目的,但由于这些显影液对两个胶层都有腐蚀,因此工艺窗口相对较窄。
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为了评估各种显影液对 CSAR 62 电子束光刻胶的适用性,Lothar Hahn 博士(卡尔斯鲁厄理工学院 (KIT),微结构技术研究所)提供了各种在暴 100 kV 电子(剂量变化)曝光后的样品。
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为了获得得显影液的最佳性能和浸没显影期间高效性,我们推荐使用级联显影。通常我们的显影过程只在一个显影槽中进行。曝光的光刻胶区域完全溶解(对于正胶),聚合物会在这个过程中保留在显影液中,因此也连续消耗显影液。
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我们的一些客户通常会使用对碱液敏的铝衬底做光刻工艺。如果在此过程中为了使得铝衬底不被蚀刻,则可能会导致问题。我们的 MIF 显影液(AR 300-40 系列)和显影液 AR 300-26 都会强烈侵蚀铝表面,但如果使用显影液 AR 300-35,金属表面基本保持不变。
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水溶性碱显影液由于会从空气中吸收 CO 2从而导致老化失效。在这方面,缓冲水碱性显影液(AR 300-26、-35)比含有 TMAH 的 AR 300-40 系列显影液更稳定。在这个系列中,TMAH 浓度的显影液最为敏感。
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自1992年以来,我们以适中的价格为客户提供高质量的产品。得益于高效的研究部门和我们对客户需求的密切沟通,我们可以快速响应市场需求并持续提供创新性的产品。
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海淀区西三旗建材城中路12号1幢118
中国 北京(100096)
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