在适当的光谱工作范围内使用掩模在适当的曝光系统中进行曝光，例如步进式光刻机（i-、g-线）、掩模对准式光刻机或接触式光刻机。在使用激光直写曝光设备时，使用激光束直接写入结构，因此不需要掩膜版。
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我们的高灵敏度电子束光刻胶 AR-P 617 经常用于双层胶工艺，主要与 PMMA 结合使用，用于生产T-gate等剥离结构。通常必须确保两个胶层可以选择性地并且彼此独立地显影。尽管包含 MIBK 的显影液可用于此目的，但由于这些显影液对两个胶层都有腐蚀，因此工艺窗口相对较窄。
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电子束光刻胶在使用波长非常短的电子束曝光设备，可以获得高达 2 nm 的优异分辨率（高斯束）。电子束曝光通常是使用基于高斯束直写或变形束工作原理的传统电子束光刻设备来进行的。
对于AR-N/P 7000 光刻胶产品线，通常也可用于混合光刻工艺，即可以在相应的紫外光谱工作范围内使用 i-、g-线步进投影式光刻机或者接触式曝光机进行额外的曝光。
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自1992年以来，我们以适中的价格为客户提供高质量的产品。得益于高效的研究部门和我们对客户需求的密切沟通，我们可以快速响应市场需求并持续提供创新性的产品。
中国区独家代理-
北京汇德信科技有限公司
海淀区西三旗建材城中路12号1幢118
中国 北京（100096）
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