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光刻胶在微电子学和微系统技术中被广泛应用于制备微米级和亚微米级结构。Allresist涵盖了广泛的光刻胶类型,适用于多种应用。紫外正性光刻胶(紫外正胶)Allresist生产的正性光刻胶由成膜剂(如甲酚酚醛树脂)和光敏物质(如萘醌二叠胺)溶解在(如甲氧基丙基乙酸酯(PGMEA))溶剂中混合而成。
紫外负性光刻胶(紫外负胶)对于负性光刻胶的生产,还需要酚醛双氮化剂,酸化剂和氨基化合物溶解在适当的溶剂中(例如甲氧基丙基乙酸酯)。
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电子束光刻胶(电子束光阻或电子束抗蚀剂):用于电子束和深紫外光源应用于集成电路制造、主要用于掩模制造的光刻胶。这些光刻胶通常的膜厚度值为200至500 nm之间并在掩模及晶圆上实现100至500 nm的结构。
电子束光刻胶还用于电子束直写多层胶工艺中。这些通常是薄胶<100nm非常适合用于纳米光刻。通过工艺方案的优化,即使是在膜厚度为50 nm时,也可以获得厚度小于10 nm的结构。 它们的特点是对硅,玻璃和大多数金属具有很好的附着力。通过旋涂在6000至1000 rpm之间进行涂覆,可以获得厚度在20 nm至1.75 µm之间的薄膜。对于特殊的电子束应用,甚至可以达到10μm的膜厚值(AR-P 6510)。
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自1992年以来,我们以适中的价格为客户提供高质量的产品。得益于高效的研究部门和我们对客户需求的密切沟通,我们可以快速响应市场需求并持续提供创新性的产品。
中国区独家代理-
北京汇德信科技有限公司
海淀区西三旗建材城中路12号1幢118
中国 北京(100096)
电话:+86 10 8286 7920
传真:+86 10 8286 7919
电子邮件:info@allresist.cn
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